Polyurethane Polishing

Min. Order:200 pc
Keywords:CeO2 polishing pad , Polyurethane pad , CMP polishing pad
Origin:
Brand:SHP-66

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Company Information

Company NameCmppad Photoelectric Technology Co., Ltd.
Country/Region:Guang Dong - China
Business Nature:Manufacturer
Contact:CHENG.RGL
Phone:13829110879
Last Online:16 Oct, 2017
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Product Description

Leading products: cerium oxide polishing leather, polyurethane polishing pad resistance Neeb polishing leather, the CMP polished wafer carrier.
                    
        Japan Technology, Taiwan production, factory direct absolute advantage of the domestic and international prices:
        Perfect alternative LP66, LP77, LP26, LP57, IC1010, KSP imports CMP polished wafers

Used to ● precision optics ● flat glass / LCD / FPD ● storage disk drives ● semiconductor ceramic substrate ● optical glass ● LED sapphire substrate ● crystal polishing field, a variety of materials can be polished workpiece, such as silicon, gallium arsenide, quartz crystal , sapphire, metal, glass, a semiconductor ceramic material.

PAD TYPE

FILLER

AVER

DENSITY(g/cm3)

JIS-A

SH66/77

CeO2

23-25%

0.45

77-80

SH57

Unfilled

Unfilled

0.62

95

SH85

Fe2O3

7.7%

0.66

87


        The main specifications of the product are: 1400×650(mm), 1400×700(mm), 640×640(mm),700×700(mm), 850×850(mm), 900×900(mm), 1000×1000(mm);The maximum diameter of the circular piece can reach ¢1180(mm) and can be custom-tailored. The thickness ranges from 0.5mm to 5.0mm. Gum and groove are available. 
 

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