|Company Name||Cmppad Photoelectric Technology Co., Ltd.|
|Country/Region:||Guang Dong - China|
|Last Online:||16 Oct, 2017|
★ Polishing Materials Products
micro-cellular polyurethane foams are offered in a broad range of properties, making them ideal for a variety of gasketing and energy absorption needs.
micro-cellular foams are categorized by degree of deflection force. By varying the modulus and density, "SUNHIN"Performance \Plastics has developed a series of high-performance foam materials that meet the demands of design engineers in today's market.
Leading products: cerium oxide polishing leather, polyurethane polishing pad resistance Neeb polishing leather, the CMP polished wafer carrier.
Japan Technology, Taiwan production, factory direct absolute advantage of the domestic and international prices:
Perfect alternative POLYPAS、Supreme (Politex) polished pad、LP66, LP77, LP26, LP57, IC1000, KSP imports CMP polished pad
Used to ● precision optics ● flat glass / LCD / FPD ● storage disk drives ● semiconductor ceramic substrate ● optical glass ● LED sapphire substrate ● crystal polishing field, a variety of materials can be polished workpiece, such as silicon, gallium arsenide, quartz crystal , sapphire, metal, glass, a semiconductor ceramic material.